Here you assume a homogenous based structure for the plasma
No I don't. I assume plasmas are conducting. Which they are. Homogeneity has nothing to do with it.
which will, given its highly conductive state, make dielectric breakdown less likely.
No, Zeuzzz. The fact that they are conductors makes dielectric breakdown impossible, regardless of homogeneity..
See this for a start;
Model for Dielectric Breakdown in Plasma-Polymerized Styrene Thin Films
http://jjap.ipap.jp/link?JJAP/21/483/
Zeuzzz, it isn't enough to just do a google search for terms, you need to understand what the results are. And you clearly don't. The breakdown is in a
thin film, and that thin film is a
solid (basically, plastic). Plasma is used in the
preparation of the film, but the film itself is not a plasma, no breakdown is occurring in a plasma, and I doubt they even had a plasma during the dielectric breakdown measurements.
Or
Penetration of a dielectric barrier discharge plasma into textile structures at medium pressure
N De Geyter et al 2006 Plasma Sources Sci. Technol. 15 78-84
http://www.iop.org/EJ/abstract/0963-0252/15/1/012
Once again, Zeuzzz, it isn't enough to just see the terms you want, you need to understand the content. And you don't. What is
dielectric barrier discharge? "electrical discharge between two electrodes separated by an insulating dielectric barrier." Now let's look at the text of the paper you cited to see their setup:
"Two circular copper electrodes (diameter = 7 cm) are placed within a cylindrical enclosure. Both electrodes are covered with a glass plate (thickness = 2 mm) and the interelectrode distance is 8 mm. The upper electrode is connected to an ac power source (frequency 50 kHz). The lower electrode is fixed and connected to the earth.
...
At the top of the cylindrical enclosure, air (Air Liquide—Alphagaz 1) is fed into the system at 0.5 l min−1."
Translation: air is the dielectric barrier, and it's being turned
into plasma by the discharge. The air experiences dielectric breakdown when it changes from a gas to a plasma. The plasma never experiences a dielectric breakdown, because
it's a conductor.
And also you cant ignore the chemistry involved either, as pointed out here:
Dielectric breakdown in F-doped SiO2 films formed by plasma-enhanced chemical vapor deposition
http://ieeexplore.ieee.org/Xplore/l...0709302.pdf?arnumber=709302&authDecision=-203
I don't even need to look at the link on that one, because it's obvious from the title how monumentally wrong you are. "Plasma-enhanced chemical vapor deposition" is a method for making thin films. SOLID thin films, in this case of
glass. The films themselves are not plasma, they contain no plasma, they are not kept in plasma once they are manufactured. The dielectric breakdown occurs in the thin films when subjected to large electric fields, AFTER they are manufactured. No plasma is involved in the dielectric breakdown.
EPIC fail here, Zeuzzz. Simply epic.